IN-SITU OPTICAL EMISSION MONITORING SYSTEM FOR MATERIAL PROCESSES
Material process is a discipline, which requires dedicated and high precision technologies for deposition or removal of material. How to optimize the processes is a very challenging problem! Optimization usually proceeded by try-and -error and became a "Trade Secrete" afterward. But these optimization methods are not cost effective and nor compatible with the time-dependent processes.
The state of art is to develop an integrated system for real-time and in-situ processes monitoring. Atomic Engineering Corp. (AEC) has developed an integrated system consists of fiber-optical spectrometers and softwares capable of real-time decision-making.
The system is capable of:
- Calibration based on extensive database;
- Detection of processes degradation to comprehend the drift in the processes due to time dependent environmental effects;
- Fault and impurity trace identification;
- Quantitative multi-element identification and
- Real-time decision making
SPECIFICATION
- 1 central spectrometer + 3 sub spectrometers
First detector covers a range of 200-450nm which provides a resolution FWHM of ~ 0.45nm. The second grating covers [450-700nm], grating #3 covers [700-950nm], grating #4 covers [950-1100nm]. The resolution is in order of 0.55nm in the higher wavelengths range.
- Intensity calibration kit,
- Wavelength calibration kit,
- ADC 1000 USB External A/D card, and interface cables,
- 4 optical fiber, 2m each,
- Interface component: collimating lens attached to the quartz window on the reactor chamber for non-invasive monitoring
- Data Acquisition and control software
- AEC expert software system
APPLICATION
- Plasma processing,
- Laser processing,
- Thin film processing,
- Microwave CVD,
- Radio wave CVD,
- Ion etching,
- Nano-material processes.